Indium tin oxide (ITO), a transparent conductive oxide (TCO) material, is widely used today in various industries. However, many researchers are dedicated to find alternative materials to replace ITO, since the cost of Indium has been rising for many years due to its scarcity.

 

Among these alternatives, Gallium-doped zinc oxide (GZO) has drawn much attention lately. Our research group established our own atmospheric pressure plasma jet (APPJ) system which enabled us to deposit GZO thin films on the the large-area glass substrate with raster scanning trajectory in atmospheric environment, and spared us the high expense of applying vacuum equipment.

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Recently, we successfully combine laser-assisted system and APPJ system to deposit micron width transparent conductive thin films on glass substrate.